Secondary Electron Emission Spectroscopy and Total Electron Yield Measurements for the Assessment of Near Surface Damage in Diamond
A. Hoffman, S. Steven and R. Kalish, Diam. Rel. Mat., 1 (1992) 440-445
A. Hoffman, S. Steven and R. Kalish, Diam. Rel. Mat., 1 (1992) 440-445
A. Laikhtman, Y. Avigal, R. Kalish, A. Hoffman, A. Breskin, R. Chechik, E. Shefer and Y. Lifshitz. App. Phys. Lett. 73 (1998) 1433-1436
A. Laikhtman, Y. Avigal, R. Kalish, A. Breskin, R. Chechik E. Shefer, Y. Lifshitz and A. Hoffman Diam. Rel. Mat. 8 (1999) 725-731
A. Laikhtman, R. Kalish, A. Breskin, R. Chechik and A. Hoffman. J. App. Phys. 88 (2000) 2451-2455
G. Piantanida, A. Breskin, R. Chechik, O. Katz, A. Laikhtman, A. Hoffman and C. Caluzza, J. Appl. Phys. 89 (2001) 8259-8264
A.Hoffman , A. Laikhtman, S.Ustaze, M. Hadj Hamou, M.N. Hedhili, J-P. Guillotin and R. Azria. J. App. Phys. 91 (2002) 4726-4732
Sh. Michaelson, V. Richter, R. Kalish, R. Ahvaldiani, A. Hoffman and E. Cheifetz, Thin Solid Films, 420-421 (2002) 185-189
R. Kalish, V. Richter#, B. Fizgeer#, N. Koenigsfeld, Y. Avigal, Sh. Michaelson, A. Hoffman, E. Cheifetz and D. Hoxley, J. Wide Bandgap Materials (2002), 9(1),
N. Koenigsfeld, R. Kalish and A. Hoffman, Appl. Phys. Lett, (2003) 82(26) 4687-4689
A. Hoffman, R. Akhvlediani, A. Laikhtman A. Lafosse, J.-P. Guillotin and R. Azria. J. App. Phys, 95(4), 1895-1899 (2004)
V. Richter, B. Fizgeer, Sh. Michaelson, A. Hoffman, R. Kalish, J. App. Phys., (2004), 96 (10), 5824-5829
Sh. Michaelson*, R. Akhvlediani, O. Ternyak and A. Hoffman, A. Breskin and R. Chechik, Diam. Rel. Mat., 14 (3-7) 546-551 (2005)
A. Hoffman, I. Andrienko, D.N. Jamieson and S. Prawer, App. Phys. Lett., 86 (2005), 044103
Z. Shpilman, Sh. Michaelson, R. Kalish and A. Hoffman Diam. Rel. Mat., 15(2006) 846-849
O. Ternyak, Sh. Michaelson, R. Akhvlediani, A. Hoffman, Diam. Rel. Mat. , 15 (2006) 850-853
A. Hoffman, A. Lafosse and R. Azria, Phys. Rev. B., 73(8) 085423, 2006
,A. Hoffman, A. Lafosse and R. Azria, App. Phys. Lett. 88 (2006) 172111
Z. Shpilman, Sh. Michaelson, B. Philosoph, R. Kalish, and A. Hoffman, App. Phys. Lett. 89, 252114 (2006)
O. Ternyak*, E. Cheifetz, S. Shchemelinin, H. Zhang, R. Chechik, A. Breskin and A Hoffman. Diam. Rel. Mat., 16 (2007) 861-866O
Sh. Michaelson, O. Tarnyak, R. Akhvlediani and A. Hoffman, Journal of Chemical Vapor Deposition, (14) 196-212, 2008
A.Stacey, S. Prawer, S. Rubanov , R. Ahvalediani, S. Michaelson and A. Hoffman, Journ. App. Phys. 2009, 106(6) 063715/1-063715/5
A. Stacey, S. Prawer, S. Michaelson, A. Hoffman*, Appl. Phys Lett. (2009), 95, 262109.
O. Reinharz Bar-Hama , R. Akhvlediani and A. Hoffman. Phys. Stat. Sol. A 1–7 (2012) / DOI 10.1002/pssa.201200028
O. Reinharz Bar-Hama and A. Hoffman, Diam. Rel. Matt. 32 (2013) 61–65.
S. Elfimchev, S. Michaelson, R. Akhvlediani, M. Chandran, H. Kaslasi and A. Hoffman. Phys. Status Solidi A, 1-6(2014) / DOI 10.1002/pssa.201431168
S. Elfimchev, M. Chandran, R. Akhvlediani, and A. Hoffman. Phys. Status Solidi A, 212 (2015) 2583-2588
S. Elfimchev*, M. Chandran, R. Akhvlediani, A. Hoffman. Appl. Surf. Science, 410 (2017) 414-422
Alastair Stacey*, Nikolai Dontschuk, Jyh-Pin Chou*, David A. Broadway, Alex Schenk, Michael J. Sear, Jean-Philippe Tetienne, Alon Hoffman, Steven Prawer, Chris I. Pakes, Anton Tadich,