Enhancement of Diamond CVD nucleation by Ultrasonic Abrasion of Substrate with a Mixture Metal and Diamond Particles
Y. Chakk, R. Brener and A. Hoffman, App. Phys. Lett., 66 (1995) 2819-1821
תפריט
Y. Chakk, R. Brener and A. Hoffman, App. Phys. Lett., 66 (1995) 2819-1821
A. Hoffman, A. Fayer, A. Laiktman and R. Brener, J. Appl. Phys., 77 (1995) 3126-3133
A. Hoffman, A. Laikhtman, Y. Avigal, R. Brener and P.J. Evans, Diam. Rel. Mat., 4 (1995) 765-769
Y. Chaak, R. Brener & A. Hoffman, Chemical Vapor Deposition 4 (1995) 153-163 Publication in PDF
Y. Chakk, R. Brener and A. Hoffman, Diam. Rel. Mat., 5 (1996) 286-291
I. Gouzman, I. Lior and A. Hoffman App. Phys. Lett. 72 (3) (1998) 296-298
R.Shima, Y. Chakk, M. Folman and A. Hoffman. Diam. Rel. Mat. 7 (1998) 182-187
I. Gouzman and A. Hoffman. Diam. Rel. Mat. 7 (1998) 209-214
I. Efremenko, M. Sheintuch, I. Gouzman and A. Hoffman J. Cryst. Growth, 198/199 (1999) 951-956
I. Gouzman, R. Shima-Edelstein, A. Hoffman, G. Comtet, L. Hellner, G. Dujardin and S. Roter. Diam. Rel. Mat. 8 (1999) 132-138
R. Shima-Edelstein, I. Gouzman, M. Folman, A. Hoffman and S. Roter. Diam. Rel. Mat. 8 (1999) 139-145
Y. Avigal and A. Hoffman. Diam. Rel. Mat. 8(1999)127-131
R. Shima, I. Gouzman and A. Hoffman, Carbon 39 (2001) 337-342
A. Hoffman, A. Heiman, and S. Christiansen. J. App. Phys. 89 (2001) 5769-5773
R. Akhvalediani, I. Lior, Sh. Michaelson and A. Hoffman, Diam. Rel. Mat. 11 (2002) 545-549
A. Hoffman, A. Heiman, H.P. Strunk and S. H.Christiansen, J. App. Phys, 91 (2002) 3336-3344
Y. Lifshitz, Th. Kohler, Th. Frauenheim, I. Gouzman, A. Hoffman, R.Q. Zhang, X.T. Zhou and S.T. Lee, Science 297(2002) 1531-1533
A. Hoffman, X.M. Meng, S.T. Lee, R. Akhveldiany and Y. Lifshitz. Phys. Rev. Lett. (2004) 93(5) 056101
Y. Lifshitz, R. Edrei, A. Hoffman, E. Grossman, G.D. Lempert, J. Berthold, B. Schultrich and H.U. Jäger, Diam. Rel. Mat., 16 (10),(2007), 1771-1776
J-C. Arnault, S. Saada, Sh. Michaelson, N.K. Hangaly, R. Akhvelediani and A. Hoffman, Diam. Rel. Mat., 17 (2008) 377-382
J.C. Arnault, S. Saada, S. Delclos, L. Rocha, L. Intiso, R. Polini, S. Michaelson, A. Hoffman and P. Bergonzo. Journal of Chemical Vapor Deposition, (14)
A. Hoffman, Sh. Michaelson, R. Akhvlediani, N.K. Hangaly, S. Gsell, R. Brescia, M. Schreck, B. Stritzker, J-C. Arnault and S. Saada. Phys. Stat. Sol. A
Z. Shpilman, I. Gouzman, E. Grossman, and A. Hoffman, Appl. Phys. Lett , 96, 104101 (2010)
