Synchrotron Radiation X-Ray Photoelectron Spectroscopy Study of Initial Stages of Atomic Layer Deposited HfOx Films Formation on Silicon and SiGe Substrates
Sh. Michaelson, R. Akhvlediani, I. Milstein, A. Hoffman, J. Salzman, E. Lipp, R. Shima- Edelstein, A. Stacey and B.C.C. Cowei
